LC/MS of products of MPO/H2O2 oxidation of 3-OH-CBZ
Compound or Possible Structure | Retention Time | Molecular Ion (MH+) | Fragment Pattern m/z (Percentage of Intensity) |
|---|---|---|---|
| min | |||
| 3-OH-CBZ dimer | 9.1 | 503 (CC1) | 503.2 (20%), 460.1 (100%), 443.6 (25%), 417.1 (20%), 414.7 (20%) |
| 12.1 | 503 (CC2) | 503.4 (90%), 486.2 (20%), 485.4 (30%), 469.0 (50%), 460.5 (100%), 443.4 (100%), 441.4 (75%), 417.0 (25%), 414.9 (30%), 213.1 (25%) | |
| 13.9 | 503 (CC3) | 503.0 (100%), 486.1 (25%), 459.9 (75%), 457.9 (75%), 442.8 (30%), 415.3 (25%), 386.8 (25%), 208.6 (50%) | |
| 3-OH-CBZ NATyr cross dimer | 9.0 | 474 (CY1) | 474.0 (50%), 456.2 (10%), 429.2 (100%), 386.5 (35%), 343.3 (15%), 341.4 (15%) |
|
| 9.6 | 474 (CY2) | 474.2 (75%), 431.2 (40%), 428.8 (40%), 386.4 (100%), 369.1 (25%), 341.4 (20%) |